High mobility transistors

ABSTRACT

An integrated circuit containing an n-channel finFET and a p-channel finFET is formed by forming a first polarity fin epitaxial layer for a first polarity finFET, and subsequently forming a hard mask which exposes an area for a second, opposite, polarity fin epitaxial layer for a second polarity finFET. The second polarity fin epitaxial layer is formed in the area exposed by the hard mask. A fin mask defines the first polarity fin and second polarity fin areas, and a subsequent fin etch forms the respective fins. A layer of isolation dielectric material is formed over the substrate and fins. The layer of isolation dielectric material is planarized down to the fins. The layer of isolation dielectric material is recessed so that the fins extend at least 10 nanometers above the layer of isolation dielectric material. Gate dielectric layers and gates are formed over the fins.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.16/206,045, filed Nov. 30, 2018, which is a continuation of U.S. patentapplication Ser. No. 15/292,373, filed Oct. 13, 2016 (now U.S. Pat. No.10,163,725), which is a divisional of U.S. patent application Ser. No.14/572,949, filed Dec. 17, 2014 (now U.S. Pat. No. 9,496,262), whichclaims the benefit of U.S. Provisional Application No. 61/921,454, filedDec. 28, 2013, all of which are incorporated herein by reference intheir entirety.

FIELD OF THE INVENTION

This invention relates to the field of integrated circuits. Moreparticularly, this invention relates to fin field effect transistors(finFETs) in integrated circuits.

BACKGROUND OF THE INVENTION

Integrated circuits having fin field effect transistors (finFETs) attainhigh gate density, but lack transistor performance offered by planartransistors using high mobility materials such as III-V materials orgermanium. Integrating high mobility materials into high densityintegrated circuits has been problematic.

SUMMARY OF THE INVENTION

The following presents a simplified summary in order to provide a basicunderstanding of one or more aspects of the invention. This summary isnot an extensive overview of the invention, and is neither intended toidentify key or critical elements of the invention, nor to delineate thescope thereof. Rather, the primary purpose of the summary is to presentsome concepts of the invention in a simplified form as a prelude to amore detailed description that is presented later.

An integrated circuit containing an n-channel fin field effecttransistor (finFET) and a p-channel finFET may be formed by forming afirst polarity (e.g., p-channel) fin epitaxial layer in a first area andforming a second polarity (e.g., n-channel) fin epitaxial layer in asecond area. A fin mask is formed over the first polarity fin epitaxiallayer and the second polarity fin epitaxial layer to define areas for anp-channel fin and a n-channel fin. A fin etch process removes epitaxialmaterial in areas exposed by the fin mask to leave the n-channel fin andthe p-channel fin. An isolation oxide layer is formed over the n-channelfin and the p-channel fin. A planarizing process planarizes theisolation oxide layer proximate to top surfaces of the n-channel fin andthe p-channel fin. The isolation oxide layer is recessed by a subsequentetchback process, exposing the n-channel fin and the p-channel fin. Gatedielectric layers and gates are formed over the exposed n-channel finand the p-channel fin.

DESCRIPTION OF THE VIEWS OF THE DRAWING

FIG. 1 is a cross section of an example integrated circuit containing ann-channel finFET and a p-channel finFET.

FIG. 2A through FIG. 2O are cross sections of the integrated circuit ofFIG. 1, depicted in successive stages of an example fabrication processsequence.

FIG. 3A through FIG. 3H are cross sections of the integrated circuit ofFIG. 1, depicted in successive stages of another example fabricationprocess sequence.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

The present invention is described with reference to the attachedfigures. The figures are not drawn to scale and they are provided merelyto illustrate the invention. Several aspects of the invention aredescribed below with reference to example applications for illustration.It should be understood that numerous specific details, relationships,and methods are set forth to provide an understanding of the invention.One skilled in the relevant art, however, will readily recognize thatthe invention can be practiced without one or more of the specificdetails or with other methods. In other instances, well-known structuresor operations are not shown in detail to avoid obscuring the invention.The present invention is not limited by the illustrated ordering of actsor events, as some acts may occur in different orders and/orconcurrently with other acts or events. Furthermore, not all illustratedacts or events are required to implement a methodology in accordancewith the present invention.

An integrated circuit containing an n-channel finFET and a p-channelfinFET may be formed by forming a first fin epitaxial layer for a firstpolarity finFET, and subsequently forming a hard mask which exposes anarea for a second fin epitaxial layer for a second, opposite, polarityfinFET. The integrated circuit may be formed by two example processsequences. In the first sequence, a first hard mask is formed over asubstrate comprising silicon so as to expose an area for the p-channelfinFET and cover an area for the n-channel finFET. A p-channel finepitaxial layer is formed in the area exposed by the first hard mask.The first hard mask is removed and a second hard mask is formed whichexposes the area for the n-channel finFET and covers the p-channel finepitaxial layer. An n-channel fin epitaxial layer is formed in the areaexposed by the second hard mask. The second hard mask is removed.Alternatively, the p-channel fin epitaxial layer may be formed after then-channel fin epitaxial layer using an analogous process sequence. A finmask is formed over the p-channel fin epitaxial layer and the n-channelfin epitaxial layer to define areas for an n-channel fin and a p-channelfin, respectively. A fin etch process removes epitaxial material inareas exposed by the fin mask to leave the n-channel fin and thep-channel fin. An isolation oxide layer is formed over the n-channel finand the p-channel fin. A planarizing process planarizes the isolationoxide layer proximate to top surfaces of the n-channel fin and thep-channel fin. The isolation oxide layer is recessed by a subsequentetchback process, exposing the n-channel fin and the p-channel fin. Gatedielectric layers and gates are formed over the exposed n-channel finand the p-channel fin.

The integrated circuit may also be formed by forming the p-channel finepitaxial layer over exposed areas of the substrate. A hard mask isformed over the p-channel fin epitaxial layer so as to expose the areafor the n-channel finFET and cover the area for the p-channel finFET. Anetch process removed at least a portion of the p-channel fin epitaxiallayer in areas exposed by the hard mask. The n-channel fin epitaxiallayer is formed over exposed areas of the substrate in the area exposedby the second hard mask. The hard mask is subsequently removed.Alternatively, the p-channel fin epitaxial layer may be formed after then-channel fin epitaxial layer using an analogous process sequence. Thefin mask is formed and the fin etch process forms the n-channel fin andthe p-channel fin. The recessed isolation oxide layer is formed so as toexpose the -channel fin and the p-channel fin, and the gate dielectriclayers and gates are formed over the exposed n-channel fin and thep-channel fin.

FIG. 1 is a cross section of an example integrated circuit containing ann-channel finFET and a p-channel finFET. The integrated circuit 100 isformed on a substrate 102 including crystalline semiconductor material104 which includes crystalline silicon extending to a top surface 106 ofthe substrate 102. The substrate 102 may be, for example, a bulk siliconwafer, an epitaxial silicon wafer, or a silicon-on-insulator (SOI)wafer. The integrated circuit 100 includes an n-channel finFET 108 and ap-channel finFET 110. The integrated circuit 100 may optionally includea planar n-channel metal oxide semiconductor (NMOS) transistor 112 and aplanar p-channel metal oxide semiconductor (PMOS) transistor 114. Theintegrated circuit 100 may optionally include field oxide 116 tolaterally separate the n-channel finFET 108 and the p-channel finFET110, and to laterally separate the planar NMOS transistor 112 and theplanar PMOS transistor 114, if present. The n-channel finFET 108 and theplanar NMOS transistor 112 are disposed on a p-type region 118 of thesubstrate 102, which may be a p-type well 118 as shown in FIG. 1. Thep-channel finFET 110 and the planar PMOS transistor 114 are disposed onan n-type region 120 of the substrate 102, which may be an n-type well120 as shown in FIG. 1. An isolation dielectric layer 122 is disposedover the substrate 102 in areas for the n-channel finFET 108 and thep-channel finFET 110. The isolation dielectric layer 122 may be 20nanometers to 40 nanometers thick, and may include one or more layers ofsilicon dioxide and/or boron phosphorus silicate glass (BPSG), andpossibly other dielectric material such as silicon oxynitride.

The n-channel finFET 108 includes a first buffer 130 ofgermanium-containing semiconductor material on the top surface 106 ofthe substrate 102, and an n-channel fin 132 on the first buffer 130,extending above a top surface 124 of the isolation dielectric layer 122by a first exposure height 126 of at least 10 nanometers. The firstbuffer 130 may be 1 nanometer to 5 nanometers thick, and include, forexample, substantially all germanium, or may include a mixture ofsilicon-germanium. A germanium atomic fraction of the first buffer 130may be graded so that the germanium atomic fraction at a bottom surfaceof the first buffer 130, contacting the substrate 102, may be less than20 percent and the germanium atomic fraction at a top surface of thefirst buffer 130, contacting the n-channel fin 132, may be greater than80 percent. The n-channel fin 132 includes semiconductor materialdifferent from silicon, possibly having a higher electron mobility thansilicon, which may advantageously provide a desired on-state current forthe n-channel finFET 108 higher than a corresponding finFET with asilicon fin. The n-channel fin 132 may include, for example galliumarsenide, indium gallium arsenide with an indium to gallium ratio of50:50 to 57:43, indium phosphide, germanium or silicon-germanium with agermanium atomic fraction greater than 80 percent. The first exposureheight 126 may be 20 nanometers to 40 nanometers. A first width 128 ofthe n-channel fin 132 above the top surface 124 of the isolationdielectric layer 122 may be less than 30 nanometers, for example 10nanometers to 20 nanometers. The isolation dielectric layer 122surrounds the first buffer 130 and a lower portion of the n-channel fin132. The n-channel finFET 108 includes a first gate dielectric layer 134disposed over the n-channel fin 132, and a first gate 136 disposed overthe first gate dielectric layer 134. The first gate 136 may includepolycrystalline silicon, referred to as polysilicon, metal silicide ormetal gate material.

The p-channel finFET 110 may include an optional germanium-containingsecond buffer 138 2 nanometers to 5 nanometers thick on the top surface106 of the substrate 102. The p-channel finFET 110 includes a p-channelfin 140 on the second buffer 138 if present, or on the substrate 102 ifthe second buffer 138 is not present. The p-channel fin 140 extendsabove the top surface 124 of the isolation dielectric layer 122 by asecond exposure height 142 of at least 10 nanometers. The p-channel fin140 includes semiconductor material different from silicon and differentfrom the n-channel fin 132, possibly having a higher hole mobility thansilicon, which may advantageously provide a desired on-state current forthe p-channel finFET 110 higher than a corresponding finFET with asilicon fin. The p-channel fin 140 may include, for example, germaniumor silicon-germanium with a germanium atomic fraction greater than 80percent. The second exposure height 142 may be 20 nanometers to 40nanometers. A second width 144 of the p-channel fin 140 above the topsurface 124 of the isolation dielectric layer 122 may be less than 30nanometers, and may be substantially equal to the first width 128 of then-channel fin 132. The isolation dielectric layer 122 surrounds thesecond buffer 138 if present and a lower portion of the p-channel fin140. The p-channel finFET 110 includes second gate dielectric layer 146disposed over the p-channel fin 140, and a second gate 148 disposed overthe second gate dielectric layer 146. The second gate 148 may includepolysilicon, metal silicide or metal gate material. The n-channel finFET108 and the p-channel finFET 110 may be part of a logic circuit, or maybe part of a memory cell such as a static random access memory (SRAM)cell, advantageously providing higher speed and higher density comparedto logic circuits or memory cells of planar MOS transistors.

The planar NMOS transistor 112 includes a third gate dielectric layer150 disposed over the substrate 102 and an NMOS gate 152 disposed overthe third gate dielectric layer 150. N-type source/drain regions 154 aredisposed in the substrate 102 adjacent to, and extending partway under,the NMOS gate 152. Sidewall spacers 156 may be disposed adjacent to theNMOS gate 152. The planar PMOS transistor 114 includes a fourth gatedielectric layer 158 disposed over the substrate 102 and a PMOS gate 160disposed over the fourth gate dielectric layer 158. P-type source/drainregions 162 are disposed in the substrate 102 adjacent to, and extendingpartway under, the PMOS gate 160. Sidewall spacers 164 may be disposedadjacent to the PMOS gate 160. The planar NMOS transistor 112 and theplanar PMOS transistor 114 may be part of an input/output (I/O) circuit,and may operate at a higher voltage than the n-channel finFET 108 andthe p-channel finFET 110.

FIG. 2A through FIG. 2O are cross sections of the integrated circuit ofFIG. 1, depicted in successive stages of an example fabrication processsequence. Referring to FIG. 2A, formation of the integrated circuitbegins with providing the substrate 102. The optional field oxide 116,if present, is formed in the substrate 102, for example by a shallowtrench isolation (STI) process. The p-type region 118 and/or the n-typeregion 120 may be formed in the substrate 102 by implanting p-typedopants and/or n-type dopants, respectively, into the semiconductormaterial 104 and annealing the substrate 102 to activate the dopants.

A first hard mask 166 is formed over the substrate 102 so as to exposethe substrate 102 in an area for the p-channel finFET 110 and to coverthe substrate 102 in areas for the n-channel finFET 108, the planar NMOStransistor 112 and the planar PMOS transistor 114. The first hard mask166 may be 20 nanometers to 30 nanometers thick and may include one ormore layers of silicon dioxide, silicon nitride and/or siliconoxynitride. The first hard mask 166 may be formed by a plasma enhancedchemical vapor deposition (PECVD) process using tetraethylorthosilicate, also known as tetraethoxysilane (TEOS) to form silicondioxide and/or bis (tertiary-butylamino) silane (BTBAS) to form siliconnitride, as appropriate. A mask of photoresist may be formed over thelayers of silicon dioxide, silicon nitride and/or silicon oxynitride toexpose the area for the p-channel finFET 110, and the layers of silicondioxide, silicon nitride and/or silicon oxynitride in the area for thep-channel finFET 110 may be removed by a subsequent plasma etch process.The mask of photoresist is subsequently removed.

Referring to FIG. 2B, the optional second buffer 138 may be formed byselective epitaxial growth on the n-type region 120 of the substrate 102in the area exposed by the first hard mask 166. The second buffer 138 isgrown so as not to form a significant amount of epitaxial material onthe first hard mask 166. The second buffer 138 may be grown usinggermane and possibly silane or dichlorosilane at a pressure of less than20 torr and a temperature of 500° C. to 650° C. A p-channel finepitaxial layer 168 is formed by a selective epitaxial growth process onthe second buffer 138 if present, or on the n-type region 120 of thesubstrate 102 if the second buffer 138 is not present. The p-channel finepitaxial layer 168 is grown so as not to form a significant amount ofepitaxial material on the first hard mask 166. The p-channel finepitaxial layer 168 may be 50 nanometers to 100 nanometers thick and mayinclude, for example, germanium or silicon-germanium with a germaniumatomic fraction greater than 80 percent. The p-channel fin epitaxiallayer 168 may be grown using a similar epitaxial growth process asdescribed for the second buffer 138. The p-channel fin epitaxial layer168 may be doped with n-type dopants during the selective epitaxialgrowth process to provide a desired threshold voltage for the p-channelfinFET 110. Alternatively, the p-channel fin epitaxial layer 168 may beformed by a molecular beam epitaxy (MBE) process.

Referring to FIG. 2C, the first hard mask 166 of FIG. 2B is removed,leaving the second buffer 138 and the p-channel fin epitaxial layer 168in place. The first hard mask 166 may be removed by a plasma etch usingfluorine radicals that is selective to the semiconductor materials ofthe p-channel fin epitaxial layer 168 and the substrate 102.

Referring to FIG. 2D, a second hard mask 170 is formed over thesubstrate 102 and over the p-channel fin epitaxial layer 168, so as toexpose the substrate 102 in the area for the n-channel finFET 108 and tocover the substrate 102 and the p-channel fin epitaxial layer 168 in theareas for the p-channel finFET 110, the planar NMOS transistor 112 andthe planar PMOS transistor 114. The second hard mask 170 may have a samestructure and composition as the first hard mask 166 of FIG. 2A and FIG.2B, and may be formed by a similar process.

Referring to FIG. 2E, the first buffer 130 is formed by selectiveepitaxial growth on the p-type region 118 of the substrate 102 in thearea exposed by the second hard mask 170. The first buffer is grown soas not to form a significant amount of epitaxial material on the secondhard mask 170. The first buffer 130 may have a similar structure andcomposition as described for the second buffer 138, and may be formed bya similar process. An n-channel fin epitaxial layer 172 is formed by aselective epitaxial growth process on the first buffer 130. The firstbuffer 130 advantageously facilitates epitaxial growth of thesemiconductor material of the n-channel fin epitaxial layer 172, whichwould be problematic to grow directly on the substrate 102. Then-channel fin epitaxial layer 172 is grown so as not to form asignificant amount of epitaxial material on the second hard mask 170.The n-channel fin epitaxial layer may be 50 nanometers to 100 nanometersthick. In a version of the instant example in which the n-channel finepitaxial layer 172 is primarily indium gallium arsenide, the epitaxialprocess may use trimethyl indium, trimethyl gallium or triethyl gallium,and arsine at a pressure of 150 torr and a temperature of 750° C. to850° C. A ratio of the trimethyl indium to the trimethyl gallium may bevaried to obtain a desired ratio of indium to gallium in the n-channelfin epitaxial layer 172. In a version of the instant example in whichthe n-channel fin epitaxial layer 172 is primarily gallium arsenide, theepitaxial process may use trimethyl gallium or triethyl gallium andarsine. In a version of the instant example in which the n-channel finepitaxial layer 172 is primarily indium phosphide, the epitaxial processmay use trimethyl indium and phosphine. In a version of the instantexample in which the n-channel fin epitaxial layer 172 is primarilygermanium, the epitaxial process may use germane. In a version of theinstant example in which the n-channel fin epitaxial layer 172 isprimarily silicon-germanium, the epitaxial process may use silane ordichlorosilane and germane. Alternatively, the n-channel fin epitaxiallayer 172 may be formed by an MBE process.

Referring to FIG. 2F, the second hard mask 170 of FIG. 2E is removed,leaving the first buffer 130, the n-channel fin epitaxial layer 172, thesecond buffer 138 and the p-channel fin epitaxial layer 168 in place.The second hard mask 170 may be removed by a similar process to thatdescribed for removing the first hard mask 166 in reference to FIG. 2C.

Referring to FIG. 2G, a fin mask 174 is formed over the n-channel finepitaxial layer 172 and the p-channel fin epitaxial layer 168 so as tocover area for the n-channel fin 132 and the p-channel fin 140 of FIG.1, respectively. The fin mask 174 may optionally cover the areas for theplanar NMOS transistor 112 and the planar PMOS transistor 114, as shownin FIG. 2G, to protect the substrate 102 during a subsequent etchprocess.

Referring to FIG. 2H, a fin etch process removes semiconductor materialfrom the n-channel fin epitaxial layer 172, the p-channel fin epitaxiallayer 168, the first buffer 130 and the second buffer 138 in areasexposed by the fin mask 174 to leave the n-channel fin 132 and thep-channel fin 140 on the first buffer 130 and the second buffer 138,respectively. The fin etch process may be a reactive ion etch (RIE)process using fluorine radicals. The fin mask 174 is subsequentlyremoved, for example by an ash process followed by a wet clean processusing an aqueous mixture of ammonium hydroxide and hydrogen peroxide.Forming the n-channel fin 132 and the p-channel fin 140 with separatebuffers, as described in the instant example, advantageously providesprocess latitude for fabrication of the integrated circuit 100 which mayprovide a desired level of yield and reliability.

Referring to FIG. 2I, a layer of isolation dielectric material 176 isformed over the substrate 102, covering the n-channel fin 132 and thep-channel fin 140. The layer of isolation dielectric material 176 may beprimarily silicon dioxide and/or BPSG. The layer of isolation dielectricmaterial 176 may optionally include other dielectric material such assilicon oxynitride.

Referring to FIG. 2J, the layer of isolation dielectric material 176 isplanarized down to the n-channel fin 132 and the p-channel fin 140. Thelayer of isolation dielectric material 176 may be planarized by achemical mechanical polish (CMP) process 178 as depicted schematicallyin FIG. 2J. Alternatively, the layer of isolation dielectric material176 may be planarized by a resist etchback (REB) process in which alayer of organic resin such as photoresist is spin coated over the layerof isolation dielectric material 176 to provide a planar top surface. AnREB plasma etch process subsequently removes the layer of organic resinand a top portion of the layer of isolation dielectric material 176.Etch rates of the layer of organic resin and the layer of isolationdielectric material 176 by the REB plasma etch process are selected toprovide a desired planarity of the layer of isolation dielectricmaterial 176.

Referring to FIG. 2K, the layer of isolation dielectric material 176 ofFIG. 2J is recessed by an isotropic etch so as to expose the n-channelfin 132 and the p-channel fin 140. The recessed layer of isolationdielectric material 176 provides the isolation dielectric layer 122. Theisotropic etch to recess the layer of isolation dielectric material 176may be an isotropic plasma etch using fluorine radicals which does notsignificantly etch the semiconductor material of the n-channel fin 132and the p-channel fin 140.

Referring to FIG. 2L, the isolation dielectric layer 122 may bepatterned so as to expose the areas for the planar NMOS transistor 112and the planar PMOS transistor 114. The isolation dielectric layer 122may be patterned by forming a mask of photoresist over the isolationdielectric layer 122 and the n-channel fin 132 and the p-channel fin 140so as to expose the areas for the planar NMOS transistor 112 and theplanar PMOS transistor 114. The isolation dielectric layer 122 in theareas exposed by the mask may be removed by a timed wet etch using andilute buffered aqueous solution of hydrofluoric acid. Alternatively,the isolation dielectric layer 122 may be removed by a plasma etch withendpoint detection based on exposure of the substrate 102. The mask issubsequently removed.

Referring to FIG. 2M, the first gate dielectric layer 134 is formed overthe n-channel fin 132, and the second gate dielectric layer 146 isformed over the p-channel fin 140. The first gate dielectric layer 134and the second gate dielectric layer 146 may be formed concurrently. Thefirst gate 136 is formed over the first gate dielectric layer 134, andthe second gate 148 is formed over the second gate dielectric layer 146.Portions of the first gate 136 and the second gate 148 may be formedconcurrently. The first gate 136 has a work function appropriate for ann-channel transistor and the second gate 148 has a work functionappropriate for a p-channel transistor.

Referring to FIG. 2N, if the optional planar NMOS transistor 112 and theoptional planar PMOS transistor 114 are to be formed, the third gatedielectric layer 150 and the fourth gate dielectric layer 158 are formedover the substrate in the areas for the planar NMOS transistor 112 andthe planar PMOS transistor 114, respectively. The third gate dielectriclayer 150 and the fourth gate dielectric layer 158 may be formedconcurrently. The third gate dielectric layer 150 and the fourth gatedielectric layer 158 may be thicker than the first gate dielectric layer134 and the second gate dielectric layer 146 so that the planar NMOStransistor 112 and the planar PMOS transistor 114 may operate at ahigher voltage than the n-channel finFET 108 and the p-channel finFET110.

The NMOS gate 152 is formed over the third gate dielectric layer 150 andthe PMOS gate 160 is formed over the fourth gate dielectric layer 158.Portions of the NMOS gate 152 and the PMOS gate 160 may be formedconcurrently. After the NMOS gate 152 and the PMOS gate 160 are formed,n-type drain extensions 180 are formed in the substrate 102 adjacent to,and extending partway under, the NMOS gate 152, by implanting n-typedopants such as phosphorus and arsenic, and p-type drain extensions 182are formed in the substrate 102 adjacent to, and extending partwayunder, the PMOS gate 160, by implanting p-type dopants such as boron.The substrate 102 is annealed after the n-type dopants and p-typedopants are implanted to activate the n-type dopants and p-type dopants,possibly by a laser anneal. Subsequently, the sidewall spacers 156 and164 are formed adjacent to the NMOS gate 152 and the PMOS gate 160,respectively.

Referring to FIG. 2O, n-type source/drain implanted regions 184 areformed in the substrate 102 adjacent to the sidewall spacers 156adjacent to the NMOS gate 152, by implanting n-type dopants. P-typesource/drain implanted regions 186 are formed in the substrate 102adjacent to the sidewall spacers 164 adjacent to the PMOS gate 160, byimplanting p-type dopants. N-type source/drain implanted regions of then-channel finFET 108 may be formed concurrently with the n-typesource/drain implanted regions 184 of the planar NMOS transistor 112.Similarly, p-type source/drain implanted regions of the p-channel finFET110 may be formed concurrently with the p-type source/drain implantedregions 186 of the planar PMOS transistor 114. The substrate is annealsto activate the implanted n-type dopants and p-type dopants in then-type source/drain implanted regions 184 of the planar NMOS transistor112, the p-type source/drain implanted regions 186 of the planar PMOStransistor 114, the n-type source/drain implanted regions of then-channel finFET 108 and the p-type source/drain implanted regions ofthe p-channel finFET 110, to provide the structure of FIG. 1.

The structure of FIG. 1 may also be obtained by a process sequenceanalogous to that described in reference to FIG. 2A through FIG. 2O, inwhich the first hard mask exposes the area for the n-channel finFET andthe second hard mask exposes the area for the p-channel finFET. In sucha process sequence, the n-channel fin epitaxial layer is formed beforethe p-channel fin epitaxial layer.

FIG. 3A through FIG. 3H are cross sections of the integrated circuit ofFIG. 1, depicted in successive stages of another example fabricationprocess sequence. Referring to FIG. 3A, formation of the integratedcircuit 100 is performed as described in reference to FIG. 2A, throughformation of the optional field oxide 116, the p-type region 118 and/orthe n-type region 120. The second buffer 138 is formed by selectiveepitaxial growth on exposed areas of the semiconductor material 104 ofthe substrate 102, including the areas for the n-channel finFET 108, thep-channel finFET 110, the planar NMOS transistor 112 and the planar PMOStransistor 114. The process to grow the second buffer 138 may be asdescribed in reference to FIG. 2B. The p-channel fin epitaxial layer 168is formed by a selective epitaxial growth process on the second buffer138. The p-channel fin epitaxial layer 168 may be grown as described inreference to FIG. 2B. Alternatively, the second buffer 138 and thep-channel fin epitaxial layer 168 may be formed by an MBE process.

Referring to FIG. 3B, a hard mask 188 is formed over the p-channel finepitaxial layer 168 in the area for the p-channel finFET 110, and ispatterned so as to expose the p-channel fin epitaxial layer 168 in theareas for the n-channel finFET 108, the planar NMOS transistor 112 andthe planar PMOS transistor 114. The hard mask 188 may have the samestructure and composition as the second hard mask 170 of FIG. 2D.

Referring to FIG. 3C, the p-channel fin epitaxial layer 168 is removedin areas exposed by the hard mask 188, leaving a portion of the secondbuffer 138 in the area for the n-channel finFET 108. The p-channel finepitaxial layer 168 may be removed, for example, by a timed wet etchusing a dilute buffered aqueous solution of hydrofluoric acid.Alternatively, the p-channel fin epitaxial layer 168 may be removed by aplasma etch using fluorine radicals.

Referring to FIG. 3D, the n-channel fin epitaxial layer 172 is formed bya selective epitaxial growth process on the portion of the second buffer138 in the area for the n-channel finFET 108, and on any other portionsof the second buffer 138, for example in the areas for the planar NMOStransistor 112 and the planar PMOS transistor 114, as shown in FIG. 3D.The n-channel fin epitaxial layer 172 is grown so as not to form asignificant amount of epitaxial material on the hard mask 188.

Referring to FIG. 3E, the hard mask 188 of FIG. 3D is removed, leavingthe n-channel fin epitaxial layer 172 and the p-channel fin epitaxiallayer 168 in place on the second buffer 138. The hard mask 188 may beremoved by a similar process to that described for removing the firsthard mask 166 in reference to FIG. 2C.

Referring to FIG. 3F, the fin mask 174 is formed over the n-channel finepitaxial layer 172 and the p-channel fin epitaxial layer 168 so as tocover area for the n-channel fin 132 and the p-channel fin 140 of FIG.1, respectively. In the instant example, the fin mask 174 exposes theareas for the planar NMOS transistor 112 and the planar PMOS transistor114 to enable removal of any the n-channel fin epitaxial layer 172 andany second buffer 138 in these areas.

Referring to FIG. 3G, a fin etch process removes semiconductor materialfrom the n-channel fin epitaxial layer 172, the p-channel fin epitaxiallayer 168, the first buffer 130 and the second buffer 138 in areasexposed by the fin mask 174 to leave the n-channel fin 132 and thep-channel fin 140 on the first buffer 130 and the second buffer 138,respectively. In the instant example, the fin etch process removes anyremaining n-channel fin epitaxial layer 172 and any second buffer 138from the areas for the planar NMOS transistor 112 and the planar PMOStransistor 114.

Referring to FIG. 3H, the fin mask 174 is subsequently removed, forexample as described in reference to FIG. 2H. Forming the n-channel fin132 and the p-channel fin 140 as described in the instant exampleeliminates one hard mask and a corresponding pattern step, which mayadvantageously reduce a fabrication cost and complexity of theintegrated circuit 100. Processing of the integrated circuit 100 iscontinued as described in reference to FIG. 2I through FIG. 2O toprovide the structure of FIG. 1.

While various embodiments of the present invention have been describedabove, it should be understood that they have been presented by way ofexample only and not limitation. Numerous changes to the disclosedembodiments can be made in accordance with the disclosure herein withoutdeparting from the spirit or scope of the invention. Thus, the breadthand scope of the present invention should not be limited by any of theabove described embodiments. Rather, the scope of the invention shouldbe defined in accordance with the following claims and theirequivalents.

What is claimed is:
 1. An integrated circuit, comprising: a substratecomprising a first semiconductor material extending to a top surface ofthe substrate, the first semiconductor material comprising silicon; afield oxide in the substrate; an n-channel fin field effect transistor(finFET) on the substrate, comprising: an n-channel fin having a firstportion of a germanium-containing semiconductor material and a secondportion of a second semiconductor material different from the firstsemiconductor material; a first gate dielectric layer disposed on then-channel fin; and a first gate disposed on the first gate dielectriclayer; a p-channel finFET on the substrate, comprising: a p-channel finof a third semiconductor material different from the first semiconductormaterial and the second semiconductor material; a second gate dielectriclayer disposed on the p-channel fin; and a second gate disposed on thesecond gate dielectric layer; and an isolation dielectric layer disposedon the substrate and field oxide, laterally adjacent to the n-channelfin and the p-channel fin, such that the n-channel fin and the p-channelfin extend above the isolation dielectric layer; a planar NMOStransistor and a planar PMOS transistor disposed in the substrate,wherein the planar NMOS transistor is laterally separated from then-channel finFET by the field oxide and the planar PMOS transistor islaterally separated from the p-channel finFET by the field oxide.
 2. Theintegrated circuit of claim 1, wherein the third semiconductor materialof the p-channel fin comprises germanium.
 3. The integrated circuit ofclaim 1, wherein the second semiconductor material of the n-channel fincomprises indium gallium arsenide with an indium to gallium ratio of50:50 to 57:43.
 4. The integrated circuit of claim 1, wherein thep-channel fin further comprises a buffer of germanium between the thirdsemiconductor material and the substrate.
 5. The integrated circuit ofclaim 1, wherein a germanium atomic fraction of the first portion of then-channel fin is graded so that the germanium atomic fraction at abottom surface of the first buffer is less than 20 percent and thegermanium atomic fraction at a top surface of the first buffer isgreater than 80 percent.
 6. An integrated circuit, comprising: a siliconsubstrate; a field oxide in the silicon substrate; an n-channel finfield effect transistor (finFET) having an n-channel fin on the siliconsubstrate, the n-channel fin comprising a first semiconductor material;a p-channel finFET having a p-channel fin on the silicon substrate, thep-channel fin comprising a second semiconductor material; an isolationdielectric layer disposed on the substrate, laterally adjacent to then-channel fin and the p-channel fin, such that the n-channel fin and thep-channel fin extend above the isolation dielectric layer; and a planarNMOS transistor and a planar PMOS transistor disposed in the substrate,wherein the planar NMOS transistor is laterally separated from then-channel finFET by the field oxide and the planar PMOS transistor islaterally separated from the p-channel finFET by the field oxide.
 7. Theintegrated circuit of claim 6, wherein: the n-channel fin includes afirst buffer disposed on the silicon substrate between the siliconsubstrate and the first semiconductor material, the first buffercomprising germanium and the first semiconductor material comprisingGaAs; the n-channel finFET further includes: a first gate dielectriclayer disposed on the n-channel fin; and a first gate disposed on thefirst gate dielectric layer; the second semiconductor material of thep-channel fin comprises germanium; and the p-channel finFET furtherincludes: a second gate dielectric layer disposed on the p-channel fin;and a second gate disposed on the second gate dielectric layer.
 8. Theintegrated circuit of claim 6, wherein the second semiconductor materialof the p-channel fin comprises silicon-germanium.
 9. The integratedcircuit of claim 6, wherein the first semiconductor material of then-channel fin comprises indium gallium arsenide with an indium togallium ratio of 50:50 to 57:43.
 10. The integrated circuit of claim 7,wherein the p-channel fin further includes comprises a second bufferdisposed on the substrate, the second buffer comprising germanium. 11.The integrated circuit of claim 7, wherein a germanium atomic fractionof the first buffer is graded so that the germanium atomic fraction at abottom surface of the first buffer is less than 20 percent and thegermanium atomic fraction at a top surface of the first buffer isgreater than 80 percent.
 12. An integrated circuit, comprising: asilicon substrate; a field oxide in the substrate; an n-channel finfield effect transistor (finFET), comprising: an n-channel fin disposedon the silicon substrate; a first gate dielectric layer disposed on then-channel fin; and a first gate disposed on the first gate dielectriclayer; a p-channel finFET, comprising: a p-channel fin disposed on thesubstrate; a second gate dielectric layer disposed on the p-channel fin;and a second gate disposed on the second gate dielectric layer; anisolation dielectric layer disposed on the substrate laterallysurrounding the n-channel fin and laterally surrounding the p-channelfin, such that the n-channel fin and the p-channel fin extend above theisolation dielectric layer; a planar n-channel metal oxide semiconductor(NMOS) transistor comprising: a third gate dielectric layer disposed onthe substrate; a third gate disposed on the third gate dielectric layer;and first source and drain regions in the substrate; and a planarp-channel metal oxide semiconductor (PMOS) transistor comprising: afourth gate dielectric layer disposed on the substrate; a fourth gatedisposed on the fourth gate dielectric layer; and second source anddrain regions in the substrate; wherein the planar NMOS transistor islaterally separated from the n-channel finFET by the field oxide and theplanar PMOS transistor is laterally separated from the p-channel finFETby the field oxide.
 13. The integrated circuit of claim 12, wherein thep-channel fin comprises silicon-germanium.
 14. The integrated circuit ofclaim 12, wherein the n-channel fin comprises gallium arsenide.
 15. Theintegrated circuit of claim 12, wherein the n-channel fin comprisesindium gallium arsenide.